説明
Epitaxial Silicon (EPI)構成
Centura Epi 300 (4-chamber) · Front-end factory interface equipped with two wafer load ports, compatible with both FOUP carriers and open cassette formats (OCLP) Factory Interface software version 5.3, with version 4.0 applicable for atmospheric configurations Central wafer transfer module Magnetically driven single-arm wafer handling robot featuring on-the-fly (OTF) alignment and wafer-on-blade (WOB) detection Integrated pneumatic manifold system Dual automatic single-wafer loadlock modules utilizing point-of-use vacuum pumps (iPUP) Four process reactor chambers Quartz dome assemblies (upper and lower) for each process module Dual-zone lamp heating assemblies (top and bottom) Wafer support susceptors Jet Pack forced-air cooling system Process exhaust handling system Temperature control via optical pyrometry with closed-loop PID regulation Remote frame support structure Process gas delivery panel incorporating mass flow controllers (MFCs) and control valves Integrated leak detection and safety interlock systems Optional ambient control chamber (ACC) providing buffered storage capacity for up to 50 wafers Optional Fast Loadlock Ozonation (FLO-Zone) module for integrated oxide passivation in atmospheric configurations Vacuum configuration for reduced-pressure systems includes a dedicated iPUP for the transfer chamber and high-capacity remote pumps for each process chamber System controller: c300NT mainframe operating on a Windows NT platform Front-end PC (FE PC) providing user interface, system configuration, and operational control of the c300NT systemOEMモデルの説明
Applied Centura RP (reduced pressure) Epi systems.ドキュメント
ドキュメントなし
カテゴリ
Epitaxial deposition (EPI)
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150083
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA RP EPI
カテゴリ
Epitaxial deposition (EPI)
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150083
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Epitaxial Silicon (EPI)構成
Centura Epi 300 (4-chamber) · Front-end factory interface equipped with two wafer load ports, compatible with both FOUP carriers and open cassette formats (OCLP) Factory Interface software version 5.3, with version 4.0 applicable for atmospheric configurations Central wafer transfer module Magnetically driven single-arm wafer handling robot featuring on-the-fly (OTF) alignment and wafer-on-blade (WOB) detection Integrated pneumatic manifold system Dual automatic single-wafer loadlock modules utilizing point-of-use vacuum pumps (iPUP) Four process reactor chambers Quartz dome assemblies (upper and lower) for each process module Dual-zone lamp heating assemblies (top and bottom) Wafer support susceptors Jet Pack forced-air cooling system Process exhaust handling system Temperature control via optical pyrometry with closed-loop PID regulation Remote frame support structure Process gas delivery panel incorporating mass flow controllers (MFCs) and control valves Integrated leak detection and safety interlock systems Optional ambient control chamber (ACC) providing buffered storage capacity for up to 50 wafers Optional Fast Loadlock Ozonation (FLO-Zone) module for integrated oxide passivation in atmospheric configurations Vacuum configuration for reduced-pressure systems includes a dedicated iPUP for the transfer chamber and high-capacity remote pumps for each process chamber System controller: c300NT mainframe operating on a Windows NT platform Front-end PC (FE PC) providing user interface, system configuration, and operational control of the c300NT systemOEMモデルの説明
Applied Centura RP (reduced pressure) Epi systems.ドキュメント
ドキュメントなし