説明
Epitaxial Silicon (EPI)構成
Epi Centura 300 - RP (2-chamber) Centura 300 Epi platform configured for reduced-pressure (RP) operation with dual process modules Dual load port factory interface supporting nitrogen purge, compatible with both FOUP and open cassette formats (OCLP) Factory Interface software/hardware revision 5.3 Central wafer transfer module Single-arm robotic handler with magnetic coupling, featuring on-the-fly (OTF) wafer alignment and wafer-on-blade (WOB) sensing capability Integrated pneumatic distribution manifold system Two automated batch loadlock stations equipped with point-of-use vacuum pumps (iPUP) Pair of deposition/process chambers Quartz dome assemblies (top and bottom) for each chamber Dual lamp heating assemblies (upper and lower) Wafer support susceptor assemblies Jet Pack forced-air cooling system Process exhaust and abatement interface Low-temperature optical pyrometry for process monitoring Closed-loop thermal control utilizing optical pyrometers with PID regulation Structural remote frame support configuration Next-generation reduced-pressure gas delivery system with mass flow controllers and valve control Integrated leak detection and interlock safety systems Vacuum architecture includes dedicated iPUP for transfer chamber and high-capacity remote pumps for each process module System controller: c300NT mainframe operating on Windows NT platform Front-end control workstation (FE PC) providing user interface and command/control of the c300NT systemOEMモデルの説明
Applied Centura RP (reduced pressure) Epi systems.ドキュメント
ドキュメントなし
カテゴリ
Epitaxial deposition (EPI)
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
134970
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA RP EPI
カテゴリ
Epitaxial deposition (EPI)
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
134970
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Epitaxial Silicon (EPI)構成
Epi Centura 300 - RP (2-chamber) Centura 300 Epi platform configured for reduced-pressure (RP) operation with dual process modules Dual load port factory interface supporting nitrogen purge, compatible with both FOUP and open cassette formats (OCLP) Factory Interface software/hardware revision 5.3 Central wafer transfer module Single-arm robotic handler with magnetic coupling, featuring on-the-fly (OTF) wafer alignment and wafer-on-blade (WOB) sensing capability Integrated pneumatic distribution manifold system Two automated batch loadlock stations equipped with point-of-use vacuum pumps (iPUP) Pair of deposition/process chambers Quartz dome assemblies (top and bottom) for each chamber Dual lamp heating assemblies (upper and lower) Wafer support susceptor assemblies Jet Pack forced-air cooling system Process exhaust and abatement interface Low-temperature optical pyrometry for process monitoring Closed-loop thermal control utilizing optical pyrometers with PID regulation Structural remote frame support configuration Next-generation reduced-pressure gas delivery system with mass flow controllers and valve control Integrated leak detection and interlock safety systems Vacuum architecture includes dedicated iPUP for transfer chamber and high-capacity remote pumps for each process module System controller: c300NT mainframe operating on Windows NT platform Front-end control workstation (FE PC) providing user interface and command/control of the c300NT systemOEMモデルの説明
Applied Centura RP (reduced pressure) Epi systems.ドキュメント
ドキュメントなし