説明
説明なし構成
Brand : ASM America Type : EPSILON ONE, converted to E2000 Wafer size: 6” standard pitch/tall pitch ASM carriers, 8” compatible Bernoulli wand ATM reactor Gas system : TCS with ASM LVC, from separate LPE bubbler Diluted dopant flow for 1 line of N-dope and 1 line P-dope 5 port MPI injector Swing gate valve Software Vs 7.25.03 Host control.OEMモデルの説明
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.ドキュメント
ASM
EPSILON E2000
検証済み
カテゴリ
Epitaxial deposition (EPI)
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Idle
製品ID：
91299
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
ASM
EPSILON E2000
カテゴリ
Epitaxial deposition (EPI)
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Idle
製品ID：
91299
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available