説明
ASM Epsilon 2000 EPI Complete with HDD and Software included.構成
Upgraded from E2 to E2000. Has TCS with ASM LVC, integrated LPE bubbler Atmospheric system, N-type / P-type doping.OEMモデルの説明
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.ドキュメント
ドキュメントなし
ASM
EPSILON E2000
検証済み
カテゴリ
Epitaxial deposition (EPI)
最終検証： 60日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
Installed / Idle
製品ID：
112718
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
ASM
EPSILON E2000
カテゴリ
Epitaxial deposition (EPI)
最終検証： 60日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
Installed / Idle
製品ID：
112718
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
ASM Epsilon 2000 EPI Complete with HDD and Software included.構成
Upgraded from E2 to E2000. Has TCS with ASM LVC, integrated LPE bubbler Atmospheric system, N-type / P-type doping.OEMモデルの説明
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.ドキュメント
ドキュメントなし