説明
説明なし構成
200MM Etch P5000 Mark II Mainframe 8 slot storage elevator Phase III robot SATA RAID dual hard drive system (upgrade) Compact flash floppy replacement drive (upgrade) Flat screen monitor x2 (upgrade) Two (2) Neslab HX 150 50Ft. Hoses and cabling Remote frame with two (2) 13.56Mhz generators 12 slot gas panel Chamber A: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec. Chamber B: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec.OEMモデルの説明
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
P5000 ETCH
検証済み
カテゴリ
Etch/Asher
最終検証： 昨日
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
Deinstalled
製品ID：
113063
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
P5000 ETCH
カテゴリ
Etch/Asher
最終検証： 昨日
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
Deinstalled
製品ID：
113063
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
200MM Etch P5000 Mark II Mainframe 8 slot storage elevator Phase III robot SATA RAID dual hard drive system (upgrade) Compact flash floppy replacement drive (upgrade) Flat screen monitor x2 (upgrade) Two (2) Neslab HX 150 50Ft. Hoses and cabling Remote frame with two (2) 13.56Mhz generators 12 slot gas panel Chamber A: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec. Chamber B: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec.OEMモデルの説明
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.ドキュメント
ドキュメントなし