説明
説明なし構成
- It is configured for autoloading 200mm wafers - It has two process chambers: - CVE – XeF2 etch chamber (isotropic etching of Si) - CVD – oxide, nitride, and silicon - It does not have the Rapier chamber to run the DRIE Bosch process.OEMモデルの説明
Versalis fxP - a cluster system supporting a mixture of etch and deposition process chambers (up to 6 modules in total), useful for R&D or pilot production, saving both capital expenditure and cleanroom footprint. The fxP is an 8-sided cluster system supporting up to 6 process modules for the ultimate in throughput, availability and productivity.ドキュメント
ドキュメントなし
KLA / SPTS
VERSALIS fxP
検証済み
カテゴリ
Etch/Asher
最終検証: 30日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
93301
ウェーハサイズ:
8"/200mm
ヴィンテージ:
2018
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示KLA / SPTS
VERSALIS fxP
カテゴリ
Etch/Asher
最終検証: 30日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
93301
ウェーハサイズ:
8"/200mm
ヴィンテージ:
2018
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
- It is configured for autoloading 200mm wafers - It has two process chambers: - CVE – XeF2 etch chamber (isotropic etching of Si) - CVD – oxide, nitride, and silicon - It does not have the Rapier chamber to run the DRIE Bosch process.OEMモデルの説明
Versalis fxP - a cluster system supporting a mixture of etch and deposition process chambers (up to 6 modules in total), useful for R&D or pilot production, saving both capital expenditure and cleanroom footprint. The fxP is an 8-sided cluster system supporting up to 6 process modules for the ultimate in throughput, availability and productivity.ドキュメント
ドキュメントなし