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AVIZA / SVG / THERMCO VTR 7000
  • AVIZA / SVG / THERMCO VTR 7000
  • AVIZA / SVG / THERMCO VTR 7000
  • AVIZA / SVG / THERMCO VTR 7000
説明
Nitride Process
構成
CDA, Vac., Silane, Nitrogen plumbed currently
OEMモデルの説明
The THERMCO AVIZA VTR 7000 is a versatile vertical furnace designed for wafer processing up to 200mm and below. It offers a low cost of ownership, high process flexibility, and efficient throughput, making it suitable for meeting the process requirements of multiple generations of semiconductor devices
ドキュメント

ドキュメントなし

カテゴリ
Furnaces / Diffusion

最終検証: 23日前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

113320


ウェーハサイズ:

6"/150mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示

AVIZA / SVG / THERMCO

VTR 7000

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検証済み
カテゴリ
Furnaces / Diffusion
最終検証: 23日前
listing-photo-8a47b4f8ac2c44688eff9ccf163d11b9-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76498/8a47b4f8ac2c44688eff9ccf163d11b9/e35844e04c984ae9a30610b018a7156e_250357f9ebe740e1b6a5d2d7dc1ff9a1_mw.jpeg
listing-photo-8a47b4f8ac2c44688eff9ccf163d11b9-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76498/8a47b4f8ac2c44688eff9ccf163d11b9/862d561adbc24efbaf2add3d90056ea8_20240809073940_mw.jpg
listing-photo-8a47b4f8ac2c44688eff9ccf163d11b9-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76498/8a47b4f8ac2c44688eff9ccf163d11b9/c9f4f7d40dc442298b8d7f04340ff00f_20240809073857_mw.jpg
主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

113320


ウェーハサイズ:

6"/150mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Nitride Process
構成
CDA, Vac., Silane, Nitrogen plumbed currently
OEMモデルの説明
The THERMCO AVIZA VTR 7000 is a versatile vertical furnace designed for wafer processing up to 200mm and below. It offers a low cost of ownership, high process flexibility, and efficient throughput, making it suitable for meeting the process requirements of multiple generations of semiconductor devices
ドキュメント

ドキュメントなし

同様のリスト
すべて表示