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説明
Alpha303i-k , Anneal / D-Poly / PIQ / SIN (Depend Process with FTPS , RCU , VOS-56-003 , VMM-56-201 , VMM-56-002 , Load Lock Option )構成
FuranceOEMモデルの説明
The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.ドキュメント
ドキュメントなし
PREFERRED
SELLER
カテゴリ
Furnaces / Diffusion
最終検証： 14日前
Buyer pays 12% premium of final sale price
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
103652
ウェーハサイズ：
12"/300mm
Process:
Anneal / D-Poly / NIT / PIQ
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
PREFERRED
SELLER
TEL / TOKYO ELECTRON
ALPHA(α)-303i
カテゴリ
Furnaces / Diffusion
最終検証： 14日前
Buyer pays 12% premium of final sale price
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
103652
ウェーハサイズ：
12"/300mm
Process:
Anneal / D-Poly / NIT / PIQ
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Alpha303i-k , Anneal / D-Poly / PIQ / SIN (Depend Process with FTPS , RCU , VOS-56-003 , VMM-56-201 , VMM-56-002 , Load Lock Option )構成
FuranceOEMモデルの説明
The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.ドキュメント
ドキュメントなし