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TEL / TOKYO ELECTRON ALPHA-8SE
    説明
    説明なし
    構成
    TEL ALPHA 8SE- Z
    OEMモデルの説明
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    ドキュメント

    ドキュメントなし

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon

    検証済み

    カテゴリ
    Furnaces / Diffusion

    最終検証: 4日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    115163


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2000


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    ヴィンテージ: 2000状態: 中古
    最終確認4日前

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    検証済み
    カテゴリ
    Furnaces / Diffusion
    最終検証: 4日前
    listing-photo-145876da708f44cd944e79e8015256a6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75903/145876da708f44cd944e79e8015256a6/3530bfcce7fd47229d64a45f61d24723_telalpha8sez1page06image0001_mw.jpg
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    listing-photo-145876da708f44cd944e79e8015256a6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75903/145876da708f44cd944e79e8015256a6/7c5921892ef84ea5b52db70281ed9cb0_telalpha8sez1page10image0001_mw.jpg
    listing-photo-145876da708f44cd944e79e8015256a6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75903/145876da708f44cd944e79e8015256a6/3e7bdcbd95a14a2186b628ec2515a8d3_telalpha8sez1page14image0001_mw.jpg
    listing-photo-145876da708f44cd944e79e8015256a6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75903/145876da708f44cd944e79e8015256a6/4b2f1afbd2a24290b701025ff81f6f98_telalpha8sez1page04image0001_mw.jpg
    listing-photo-145876da708f44cd944e79e8015256a6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75903/145876da708f44cd944e79e8015256a6/a0239745ec724253933a8fabef2ac61b_telalpha8sez1page12image0001_mw.jpg
    listing-photo-145876da708f44cd944e79e8015256a6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75903/145876da708f44cd944e79e8015256a6/635f9c4c4ad349faaaed134d22f80115_telalpha8sez1page02image0001_mw.jpg
    listing-photo-145876da708f44cd944e79e8015256a6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75903/145876da708f44cd944e79e8015256a6/a2700d69c07247b18dc39d91b5d5a2c3_telalpha8sez1page03image0001_mw.jpg
    listing-photo-145876da708f44cd944e79e8015256a6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75903/145876da708f44cd944e79e8015256a6/fc0530ca08df4cfcabcf331847e5959b_telalpha8sez1page13image0001_mw.jpg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    115163


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2000


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    TEL ALPHA 8SE- Z
    OEMモデルの説明
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusionヴィンテージ: 2000状態: 中古最終検証:4日前
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusionヴィンテージ: 2018状態: 改修済み最終検証:60日以上前
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusionヴィンテージ: 0状態: 中古最終検証:60日以上前