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TEL / TOKYO ELECTRON ALPHA-8SE
  • TEL / TOKYO ELECTRON ALPHA-8SE
  • TEL / TOKYO ELECTRON ALPHA-8SE
  • TEL / TOKYO ELECTRON ALPHA-8SE
  • TEL / TOKYO ELECTRON ALPHA-8SE
  • TEL / TOKYO ELECTRON ALPHA-8SE
  • TEL / TOKYO ELECTRON ALPHA-8SE
説明
Equipment - Vertical Furnace
構成
Process - AP H2 Alloy N2 Purge System - Yes
OEMモデルの説明
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
ドキュメント
カテゴリ
Furnaces / Diffusion

最終検証: 60日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

103559


ウェーハサイズ:

8"/200mm


ヴィンテージ:

2003


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示

TEL / TOKYO ELECTRON

ALPHA-8SE

verified-listing-icon
検証済み
カテゴリ
Furnaces / Diffusion
最終検証: 60日以上前
listing-photo-f81e4ff208514f73ae7064bc4f23e123-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2863/f81e4ff208514f73ae7064bc4f23e123/637ee8748b444e6c8b129ffb701cf776_screenshot20240424112239_mw.png
listing-photo-f81e4ff208514f73ae7064bc4f23e123-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2863/f81e4ff208514f73ae7064bc4f23e123/4bddb9d766c44918a96eb19ca493608f_screenshot20240424112224_mw.png
listing-photo-f81e4ff208514f73ae7064bc4f23e123-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2863/f81e4ff208514f73ae7064bc4f23e123/7e372b2ba9054177bdd34b9167cbc735_screenshot20240424112254_mw.png
listing-photo-f81e4ff208514f73ae7064bc4f23e123-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2863/f81e4ff208514f73ae7064bc4f23e123/c673a27c1fa5457d8c782303fcf8b6e3_screenshot20240424112401_mw.png
listing-photo-f81e4ff208514f73ae7064bc4f23e123-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2863/f81e4ff208514f73ae7064bc4f23e123/a380df37caf645d4a29160ba7fa055b1_screenshot20240424112315_mw.png
listing-photo-f81e4ff208514f73ae7064bc4f23e123-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2863/f81e4ff208514f73ae7064bc4f23e123/dcec946cdd1d4162807a1fb76e194c4e_screenshot20240424112329_mw.png
主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

103559


ウェーハサイズ:

8"/200mm


ヴィンテージ:

2003


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Equipment - Vertical Furnace
構成
Process - AP H2 Alloy N2 Purge System - Yes
OEMモデルの説明
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
ドキュメント
同様のリスト
すべて表示