説明
HI TEMP OXIDE構成
General Information No Contents Configuration Remark 1 System Layout Main, Utility 2 System Type L Type 3 Side Maintenance Installed 4 System Paint Color Ivory 5 Furnace Front Surface Finish Ivory 6 Heater Model 7 Rapid Cooling Unit Not Installed 8 N2 Load Lock Not Installed 9 O2 Analyzer Not Installed 10 Cassette I/O Type Normal I/O Type NOT SMIF 11 SMIF Maker / Model Not Installed 12 AGV Compatibility Unable 13 System Main Controller WAVES 14 Mechanical Controller WAVES 15 Syquenc Controller WAVES 16 Gas Controller WAVES 17 Gas Flow Chart Panel Installed (Front, Rear) 18 Operation Panel Installed (Front, Rear) 19 Signal Tower / Colors Installed 3 COLORS 20 Furnace Temperature Controller Model 560A 21 Furnace Overtemp Detector FENWAL / DMR-5FR 22 Gas Detecter Maker / Model 23 Detecting Gas 24 Host Communications Yes 25 User Computer I/F SECS 26 Manual (Drawing, Parts list etc) Gas System 1 Process Gas N2, O2, H2, HCL, AR 2 Basic Style Integrated Gas System (Fujikin) 3 Manual Valve NUPRO 4 Air-Operated Valve FUJIKIN 5 Filter MILLIPORE 6 Regulator VERIFLO 7 MFC Maker / Model STEC 7330, 7340, 7350 8 PT Sensor Maker / Model NAGANO KEIKI ZT15-220 9 DPM Maker / Model NAGANO KEIKI 10 Check Valve NUPRO 11 Baking System N/A 12 Liquid Source Auto-Refill N/A 13 Burn Controller HEC PYRO CTL 14 Vaporizer N/A Vacuum / Exhaust System 1 Pump N/A 2 Pressure Control Valve N/A 3 Pressure Controller N/A 4 Pressure Sensor N/A 5 Trap Not Installed 6 Gas Cooler N/A Wafer I Cassette Handling 1 Wafer Type 200 mm Notch Type 2 Auto Wafer Aligner Installed 3 Wafer Qty. in Cassette 26 4 Cassette Storage Qty. 21 5 Fork Type 1 + 4 6 Fork-Wafer Presence Sensor Installed 7 Fork-Variable Pitch Installed 8 Magnetic Seal Rotation Not InstalledOEMモデルの説明
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.ドキュメント
カテゴリ
Furnaces / Diffusion
最終検証： 5日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
138047
ウェーハサイズ：
不明
ヴィンテージ：
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
ALPHA-8SE
カテゴリ
Furnaces / Diffusion
最終検証： 5日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
138047
ウェーハサイズ：
不明
ヴィンテージ：
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available