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TEL / TOKYO ELECTRON TELINDY
    説明
    ALD High-K
    構成
    ALD High-K
    OEMモデルの説明
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
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    TEL / TOKYO ELECTRON

    TELINDY

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    検証済み

    カテゴリ
    Furnaces / Diffusion

    最終検証: 30日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    51948


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明

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    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion
    ヴィンテージ: 2006状態: 中古
    最終確認60日以上前

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon
    検証済み
    カテゴリ
    Furnaces / Diffusion
    最終検証: 30日以上前
    listing-photo-5b65bbe96bc54267bd8e703a7b46003d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2205/5b65bbe96bc54267bd8e703a7b46003d/a0a0f31e81104bc687dbc35ce3dbb96b_fileutil_mw.jpg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    51948


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    ALD High-K
    構成
    ALD High-K
    OEMモデルの説明
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusionヴィンテージ: 2006状態: 中古最終検証: 60日以上前
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusionヴィンテージ: 2010状態: 中古最終検証: 60日以上前
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusionヴィンテージ: 2006状態: 中古最終検証: 30日前