説明
Ion Milling System / Ion Beam Etcher構成
- Ion source: 35 cm diameter. - Includes a Hiden Mass Spectrometer end-point detector. - Has 2 x Ar lines. One goes to the plasma chamber, and the other goes to the chamber through the neutralizer. - For loading substrates, there is a loadlock - The substrate is fixed to the holder using a mechanical clamp - The holder has He backside cooling. - The holder is also water cooled. - The system has Eu CE Marking - The system has EU voltage setupOEMモデルの説明
The Ionfab 300 Plus from Oxford Instruments is a tool that uses ion beam technology for etching and deposition. It is part of the Ionfab 300 series and is designed to be versatile for multiple applications. The system has several hardware options, including open load, single substrate load lock, and cassette to cassette. It can also be configured to work with other plasma etch and deposition tools, either with a single wafer loadlock or cluster wafer handling. The Ionfab 300 Plus has several modes of operation, including ion beam etching (IBE), reactive ion beam etching (RIBE), chemically assisted ion beam etching (CAIBE), reactive ion beam deposition (RIBD), ion beam sputter deposition (IBSD), and ion assisted sputter deposition (IASD)ドキュメント
ドキュメントなし
カテゴリ
Ion Beam / IBD
最終検証： 4日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
148400
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
IONFAB 300 PLUS
カテゴリ
Ion Beam / IBD
最終検証： 4日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
148400
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Ion Milling System / Ion Beam Etcher構成
- Ion source: 35 cm diameter. - Includes a Hiden Mass Spectrometer end-point detector. - Has 2 x Ar lines. One goes to the plasma chamber, and the other goes to the chamber through the neutralizer. - For loading substrates, there is a loadlock - The substrate is fixed to the holder using a mechanical clamp - The holder has He backside cooling. - The holder is also water cooled. - The system has Eu CE Marking - The system has EU voltage setupOEMモデルの説明
The Ionfab 300 Plus from Oxford Instruments is a tool that uses ion beam technology for etching and deposition. It is part of the Ionfab 300 series and is designed to be versatile for multiple applications. The system has several hardware options, including open load, single substrate load lock, and cassette to cassette. It can also be configured to work with other plasma etch and deposition tools, either with a single wafer loadlock or cluster wafer handling. The Ionfab 300 Plus has several modes of operation, including ion beam etching (IBE), reactive ion beam etching (RIBE), chemically assisted ion beam etching (CAIBE), reactive ion beam deposition (RIBD), ion beam sputter deposition (IBSD), and ion assisted sputter deposition (IASD)ドキュメント
ドキュメントなし