説明
Electron-beam lithography system構成
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEMモデルの説明
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.ドキュメント
ドキュメントなし
RAITH
e-LiNE
カテゴリ
Lithography
最終検証： 9日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
153432
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Electron-beam lithography system構成
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEMモデルの説明
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.ドキュメント
ドキュメントなし