説明
process 1ch構成
IA_MidCurOEMモデルの説明
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.ドキュメント
ドキュメントなし
カテゴリ
Medium Current
最終検証： 12日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
144787
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2024
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
SEN CORPORATION / SUMITOMO
NV MC3
カテゴリ
Medium Current
最終検証： 12日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
144787
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2024
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
process 1ch構成
IA_MidCurOEMモデルの説明
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.ドキュメント
ドキュメントなし