説明
HG-CV System for EPI resistivity measurement構成
■ SSM 52 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit ■ PC System ■ PROCAP software ■ Performance - CV Meter Noise Test (Schottky Diode Test): 1 STD(%) <0.167% - MOS Wafer Area Test : 1 STD(%) <0.1% ■ Capacitance: 0 ~ 2000pF(1MHz), 1 ~ 20,000pF(100KHz) ■ Conductance: 0 ~ 2000μS ■ DC Bias voltage: ± 250V ■ Ramp Rate: 0 ~ 50 V/s continuously variable ■ Drive Signal Frequency at 1Mhz voltage=15mV rms ■ Stress Voltage: ± 250V ■ CDA: 80~100psi, Nitrogen for sample purge:0~15psi ■ Ambient temperature: 18° - 25°C ± 2°C over 24 hour periodOEMモデルの説明
The MCV automatic mapping systems provide a Mercury C-V measurement for non-patterned wafers used in epitaxial silicon production and front-end semiconductor processing.ドキュメント
ドキュメントなし
SEMILAB
MCV 2500
検証済み
カテゴリ
Metrology
最終検証： 60日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
101993
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEMILAB
MCV 2500
カテゴリ
Metrology
最終検証： 60日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
101993
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
HG-CV System for EPI resistivity measurement構成
■ SSM 52 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit ■ PC System ■ PROCAP software ■ Performance - CV Meter Noise Test (Schottky Diode Test): 1 STD(%) <0.167% - MOS Wafer Area Test : 1 STD(%) <0.1% ■ Capacitance: 0 ~ 2000pF(1MHz), 1 ~ 20,000pF(100KHz) ■ Conductance: 0 ~ 2000μS ■ DC Bias voltage: ± 250V ■ Ramp Rate: 0 ~ 50 V/s continuously variable ■ Drive Signal Frequency at 1Mhz voltage=15mV rms ■ Stress Voltage: ± 250V ■ CDA: 80~100psi, Nitrogen for sample purge:0~15psi ■ Ambient temperature: 18° - 25°C ± 2°C over 24 hour periodOEMモデルの説明
The MCV automatic mapping systems provide a Mercury C-V measurement for non-patterned wafers used in epitaxial silicon production and front-end semiconductor processing.ドキュメント
ドキュメントなし