説明
AlCu & Ti sputter deposition cluster tool構成
Platform: Brooks MX800 Process capability: AlCu / Ti (HIS-Modul) / degas / soft etch Peripherals: (Qty 2) Edwards L70 (Qty 2) Brooks CTI 9600 Upgraded from 6” to 8” in 2008 HIS-Module upgrade in 2021, incl. Artic chiller (-20 °C) I/O boards upgraded in 2021 Software upgraded in 2021 Turbo pumps replaced on loadlocks in 2021 Documentation available (incl. upgrade features) PM3: •DC sputtering source: ARQ151 •Currently running Aluminum-Copper Alloy (AlCu) DC-Sputter deposition process •300 mm target size •Operating at 8 kW process power •Process temperature: 270°C (Chuck Operating Temperature 300°C) PM4: •PVD sputtering source: ARQ151, upgraded for HiPIMS operation •Equipped with a 130 mm hub •Cold chuck with Arctic Chiller cooling system •Currently mounted with a 300 mm Titanium target for DC sputtering processOEMモデルの説明
提供なしドキュメント
ドキュメントなし
カテゴリ
PVD / Sputtering
最終検証： 15日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
154591
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
EVATEC / UNAXIS / OERLIKON / BALZERS
CLUSTERLINE 200
カテゴリ
PVD / Sputtering
最終検証： 15日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
154591
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
AlCu & Ti sputter deposition cluster tool構成
Platform: Brooks MX800 Process capability: AlCu / Ti (HIS-Modul) / degas / soft etch Peripherals: (Qty 2) Edwards L70 (Qty 2) Brooks CTI 9600 Upgraded from 6” to 8” in 2008 HIS-Module upgrade in 2021, incl. Artic chiller (-20 °C) I/O boards upgraded in 2021 Software upgraded in 2021 Turbo pumps replaced on loadlocks in 2021 Documentation available (incl. upgrade features) PM3: •DC sputtering source: ARQ151 •Currently running Aluminum-Copper Alloy (AlCu) DC-Sputter deposition process •300 mm target size •Operating at 8 kW process power •Process temperature: 270°C (Chuck Operating Temperature 300°C) PM4: •PVD sputtering source: ARQ151, upgraded for HiPIMS operation •Equipped with a 130 mm hub •Cold chuck with Arctic Chiller cooling system •Currently mounted with a 300 mm Titanium target for DC sputtering processOEMモデルの説明
提供なしドキュメント
ドキュメントなし