603
カテゴリ
PVD / Sputtering概要（Overview）
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti
現在の掲載品
2
サービス
検査、保証、鑑定、ロジスティクス
