説明
Some parts have been taken out.構成
構成なしOEMモデルの説明
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.ドキュメント
ドキュメントなし
MATTSON / STEAG / AST
3000
検証済み
カテゴリ
RTP/RTA
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
84895
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
MATTSON / STEAG / AST
3000
カテゴリ
RTP/RTA
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
84895
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Some parts have been taken out.構成
構成なしOEMモデルの説明
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.ドキュメント
ドキュメントなし