説明

Function: Exposure machine Structure: Modular

構成

構成なし

OEMモデルの説明

Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60