説明

With HDD ÿ Nikon NSR-S204B Scanning Lithography Machine ÿ The wavelength of the light source is 248nm and the resolution is better than 0.18ÿm. ÿ Mainly used in 4-inch, 6-inch and 8-inch production lines ÿ Widely used in MEMS/LED/compound (InP, APD)/RF/Mos.

構成

構成なし

OEMモデルの説明

The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.