We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 続きを読む
説明
説明なし構成
Gigaphoton laser 1) Original temperature: 23° 2) Original Altitude normal pressure: 755mmHg 3) Lens type: Nikon standard 4) Rack type: Right Type 5) Wafer Carrier Table: Left 6) Reticle Library: Center 7) Main unit with 0.68 NA (Auto Variable , SHRINC Conventional) Sigma 0.75 8) Pellicle reticle loader (PRL) YES 9) System for 6” reticle 6 Inch (NON-SMIF) 10) 25mm X 33mm field size YES 11) LSA system YES 12) FIA l//system YES 13) Illumination model: (Conventional, Annular,) 14) 8” wafer loader (WL Type-3), 8”ceramic holder, Flat ZONE: In 6 O'clock FLAT Type 8Inch 15) Pellicle reticle detector YES 16) BMU Type Standard 17) Pre-alignment non contact pre-alignment: Non Contact 18) Chip leveling YES 19) NEMA Box YES 20) Tool software MCSV : 3.44 21) Laser Type Giga Photon 22) Chamber Type Asahi N5Z1102 (2000.02)OEMモデルの説明
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.ドキュメント
ドキュメントなし
同様のリスト
すべて表示
NIKON
NSR-S204B
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
111988
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Gigaphoton laser 1) Original temperature: 23° 2) Original Altitude normal pressure: 755mmHg 3) Lens type: Nikon standard 4) Rack type: Right Type 5) Wafer Carrier Table: Left 6) Reticle Library: Center 7) Main unit with 0.68 NA (Auto Variable , SHRINC Conventional) Sigma 0.75 8) Pellicle reticle loader (PRL) YES 9) System for 6” reticle 6 Inch (NON-SMIF) 10) 25mm X 33mm field size YES 11) LSA system YES 12) FIA l//system YES 13) Illumination model: (Conventional, Annular,) 14) 8” wafer loader (WL Type-3), 8”ceramic holder, Flat ZONE: In 6 O'clock FLAT Type 8Inch 15) Pellicle reticle detector YES 16) BMU Type Standard 17) Pre-alignment non contact pre-alignment: Non Contact 18) Chip leveling YES 19) NEMA Box YES 20) Tool software MCSV : 3.44 21) Laser Type Giga Photon 22) Chamber Type Asahi N5Z1102 (2000.02)OEMモデルの説明
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.ドキュメント
ドキュメントなし