説明
Wet Bench Details Attached構成
Tank 1: Recirc GAMA Module (SPM) Quartz Re-circulated Process Tank Sulfuric (H2SO4) Chemical Ratio: 9:1 Single HDPE Gravity Dispense Vessel for H2O2 (Using LE100 Level Sensors) Process Temperature: 90 - 150°C ± 2.0°C In-line Heater Bubbler Level Sensors 10:1 Dilution Drain Tank 2: Quick Dump Rinse Module (QDR) Tank 3: SC1 PLUS Megasonic Module (Single Use) Series 3 Quartz Megasonic Process Tank Automatic Chemical Blending for SC1 ratios (50:2:1,100:2:1 and NH4OH only) In-line Heater - Process temperature – 40 – 60° C Tank 4: SC1 PLUS Megasonic Module (Single Use) Series 3 Quartz Megasonic Process Tank Automatic Chemical Blending for SC1 ratios (50:2:1, 100:2:1 & NH4OH only) In-line Heater - Process temperature – 40 – 60° C Dryer: IPA Dryer Module PVDF Tank Assembly with Auto Lid Bulk Fill IPAOEMモデルの説明
The AKRION GAMA is a series of automated wet stations that are flexible and modular. They are suitable for a wide variety of cleaning, etching and stripping applications for bare and reclaimed silicon wafers, IC devices, MEMS and photomasks. The GAMA series is designed to provide high throughput and precision cleaning for semiconductor manufacturing processes.ドキュメント
AKRION
GAMA
カテゴリ
Wet Benches - Auto
最終検証： 今日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
148616
ウェーハサイズ：
不明
ヴィンテージ：
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available