説明
Epi Metrology & Testers構成
Defect InspectionOEMモデルの説明
The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).ドキュメント
ドキュメントなし
検証済み
カテゴリ
Defect Inspection
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
134577
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
KLA
CANDELA CS20
カテゴリ
Defect Inspection
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
134577
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Epi Metrology & Testers構成
Defect InspectionOEMモデルの説明
The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).ドキュメント
ドキュメントなし