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KLA CANDELA CS20
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
    ドキュメント

    ドキュメントなし

    KLA

    CANDELA CS20

    verified-listing-icon

    検証済み

    カテゴリ

    Defect Inspection
    最終検証: 26日前
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    85052


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    KLA CANDELA CS20
    KLACANDELA CS20Defect Inspection
    ヴィンテージ: 0状態: 改修済み
    最終確認20日前

    KLA

    CANDELA CS20

    verified-listing-icon

    検証済み

    カテゴリ

    Defect Inspection
    最終検証: 26日前
    listing-photo-37affdd90b204b51ac7340f14665a833-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    85052


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    KLA CANDELA CS20
    KLA
    CANDELA CS20
    Defect Inspectionヴィンテージ: 0状態: 改修済み最終検証: 20日前
    KLA CANDELA CS20
    KLA
    CANDELA CS20
    Defect Inspectionヴィンテージ: 0状態: 改修済み最終検証: 26日前
    KLA CANDELA CS20
    KLA
    CANDELA CS20
    Defect Inspectionヴィンテージ: 0状態: 中古最終検証: 30日以上前