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SEMILAB FAAST 230
  • SEMILAB FAAST 230
  • SEMILAB FAAST 230
  • SEMILAB FAAST 230
説明
Non-contact CV/IV Measurement System
構成
構成なし
OEMモデルの説明
The SEMILAB FAAST 230 is a non-contact, fast in-line monitoring system designed to detect heavy metal contamination, including sub 108 atoms/cm-3 Fe detection, in a medium to high-volume manufacturing environment. It features automated wafer handling, with options for SMIF/FOUP Loadport/Versaport, and can perform full wafer FAST mapping of diffusion length, Iron, and other recombination centers. The system is configurable for 100 mm to 300 mm wafers and is compatible with other Semilab SDI FAaST tool measurement technologies. Additional options include a minienvironment, wafer edge-grip handling, wafer flipper for automatic backsurface measurement, and more.
ドキュメント

ドキュメントなし

verified-listing-icon

検証済み

カテゴリ
Defect Inspection

最終検証: 60日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

115133


ウェーハサイズ:

8"/200mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

SEMILAB

FAAST 230

verified-listing-icon
検証済み
カテゴリ
Defect Inspection
最終検証: 60日以上前
listing-photo-50e58cfedb824442a48ea4d95caeaa5a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

115133


ウェーハサイズ:

8"/200mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Non-contact CV/IV Measurement System
構成
構成なし
OEMモデルの説明
The SEMILAB FAAST 230 is a non-contact, fast in-line monitoring system designed to detect heavy metal contamination, including sub 108 atoms/cm-3 Fe detection, in a medium to high-volume manufacturing environment. It features automated wafer handling, with options for SMIF/FOUP Loadport/Versaport, and can perform full wafer FAST mapping of diffusion length, Iron, and other recombination centers. The system is configurable for 100 mm to 300 mm wafers and is compatible with other Semilab SDI FAaST tool measurement technologies. Additional options include a minienvironment, wafer edge-grip handling, wafer flipper for automatic backsurface measurement, and more.
ドキュメント

ドキュメントなし