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TEL / TOKYO ELECTRON ALPHA(α)-303i
    説明
    説明なし
    構成
    H2 ANNEAL
    OEMモデルの説明
    The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.
    ドキュメント

    ドキュメントなし

    TEL / TOKYO ELECTRON

    ALPHA(α)-303i

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    検証済み

    カテゴリ

    Furnaces / Diffusion
    最終検証: 60日以上前
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    31468


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2002

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    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON ALPHA(α)-303i
    TEL / TOKYO ELECTRONALPHA(α)-303iFurnaces / Diffusion
    ヴィンテージ: 0状態: 中古
    最終確認2日前

    TEL / TOKYO ELECTRON

    ALPHA(α)-303i

    verified-listing-icon

    検証済み

    カテゴリ

    Furnaces / Diffusion
    最終検証: 60日以上前
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    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    31468


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2002


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    H2 ANNEAL
    OEMモデルの説明
    The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON ALPHA(α)-303i
    TEL / TOKYO ELECTRON
    ALPHA(α)-303i
    Furnaces / Diffusionヴィンテージ: 0状態: 中古最終検証: 2日前
    TEL / TOKYO ELECTRON ALPHA(α)-303i
    TEL / TOKYO ELECTRON
    ALPHA(α)-303i
    Furnaces / Diffusionヴィンテージ: 0状態: 中古最終検証: 2日前
    TEL / TOKYO ELECTRON ALPHA(α)-303i
    TEL / TOKYO ELECTRON
    ALPHA(α)-303i
    Furnaces / Diffusionヴィンテージ: 2005状態: 中古最終検証: 2日前