説明
Centura Hart Number of Chambers 4 Power Requirements 3 Phase CE Marked YES Exterior Dimensions Width 66.929 in (170.0 cm) Depth 96.457 in (245.0 cm) Height 98.031 in (249.0 cm) Weight 4,550 lb (2,064 kg)構成
構成なしOEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
147425
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA
カテゴリ
Dry / Plasma Etch
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
147425
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Centura Hart Number of Chambers 4 Power Requirements 3 Phase CE Marked YES Exterior Dimensions Width 66.929 in (170.0 cm) Depth 96.457 in (245.0 cm) Height 98.031 in (249.0 cm) Weight 4,550 lb (2,064 kg)構成
構成なしOEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.ドキュメント
ドキュメントなし