説明
説明なし構成
MXP+ OxideOEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTURA
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 昨日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
117100
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA
カテゴリ
Dry / Plasma Etch
最終検証： 昨日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
117100
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
MXP+ OxideOEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.ドキュメント
ドキュメントなし