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PLASMATHERM 790
    説明
    説明なし
    構成
    PECVD
    OEMモデルの説明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    ドキュメント

    ドキュメントなし

    PLASMATHERM

    790

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    100286


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch
    ヴィンテージ: 0状態: 中古
    最終確認5日前

    PLASMATHERM

    790

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 60日以上前
    listing-photo-64bd9918ae82471ab3b0168a3a17208a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    100286


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    PECVD
    OEMモデルの説明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:5日前
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etchヴィンテージ: 1993状態: 中古最終検証:13日前
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etchヴィンテージ: 0状態: 改修済み最終検証:60日以上前