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PLASMATHERM 790
    説明
    説明なし
    構成
    Single chamber tool PECVD. 8" In Fab still running.
    OEMモデルの説明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    ドキュメント

    ドキュメントなし

    PLASMATHERM

    790

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 14日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    Installed / Running


    製品ID:

    105081


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    1993


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch
    ヴィンテージ: 0状態: 中古
    最終確認6日前

    PLASMATHERM

    790

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 14日前
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/5ad2b58debc940229c159bf3f866d4d4_59b4b90969234dcbbe54f96996e0f3f91201a_mw.jpeg
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/91b4691060c84e6e87d70b9e3e098624_b990009bce9f427787210cb7aa9a55401201a_mw.jpeg
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/0bb4aa0cd6994d2189eb93204e0ba72b_99868a6e16e7413991a9d688d5a807d545005c_mw.jpeg
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/f3341069044f494fafa36fae6deef07c_57f6981c5a8c4f5588ef7dca2086bfc045005c_mw.jpeg
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/8b05535cb5fd4a5d81857d4624b002a4_82993e5b7f4a4af49e7369cb282ba54a45005c_mw.jpeg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    Installed / Running


    製品ID:

    105081


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    1993


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    Single chamber tool PECVD. 8" In Fab still running.
    OEMモデルの説明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:6日前
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etchヴィンテージ: 1993状態: 中古最終検証:14日前
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etchヴィンテージ: 0状態: 改修済み最終検証:60日以上前