説明
-Purchased 6 years ago as a refurbished tool -Installed and never ran, sat in the clean room for a few years -When they de-installed it they were able to successfully run the tool with no issues -currently in storage構成
構成なしOEMモデルの説明
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.ドキュメント
ドキュメントなし
PLASMATHERM
790
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 10日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
111120
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
PLASMATHERM
790
カテゴリ
Dry / Plasma Etch
最終検証： 10日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
111120
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
-Purchased 6 years ago as a refurbished tool -Installed and never ran, sat in the clean room for a few years -When they de-installed it they were able to successfully run the tool with no issues -currently in storage構成
構成なしOEMモデルの説明
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.ドキュメント
ドキュメントなし