説明

-Partially working tool had issues with the relays getting confused in the order of the pneumatic sequencing -Has a filter in the lamp house and a tinted final collimating lens that together form a bypass filter of sorts centered around 330nm. Without the filter the front lens will work well for i line. Transmission spectrum is attached in the documents -Had a backside alignment system that was not functioning properly so it was removed and bypassed -Table Included -

構成

Details Attached

OEMモデルの説明

"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."