説明
説明なし構成
-Power 220v/50Hz/500VA -UV400 Optics -Lamp House 200 watt -Operation Modes: Soft Contact/Hard Contact -Chuck for 2” wafers and Mask Holder for 3” masks (Square opening 2”x2”) -Single Microscope with 3 objectives X5, X10, X20 (Includes illumination power supply) -Karl Suss CIC500 Power Supply (For the mercury lamp) with Remote Ignition Box.OEMモデルの説明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."ドキュメント
ドキュメントなし
SUSS MicroTec / KARL SUSS
MJB3
検証済み
カテゴリ
Mask/Bond Aligners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
62967
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
SUSS MicroTec / KARL SUSS
MJB3
カテゴリ
Mask/Bond Aligners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
62967
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
-Power 220v/50Hz/500VA -UV400 Optics -Lamp House 200 watt -Operation Modes: Soft Contact/Hard Contact -Chuck for 2” wafers and Mask Holder for 3” masks (Square opening 2”x2”) -Single Microscope with 3 objectives X5, X10, X20 (Includes illumination power supply) -Karl Suss CIC500 Power Supply (For the mercury lamp) with Remote Ignition Box.OEMモデルの説明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."ドキュメント
ドキュメントなし