説明
The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter. - Microscope: M400 Normalfield with revolving objective turret and trinocular microscope head - Microscope Objectives: Leitz NPL 5X, 10X, and 20X objectives - Microscope Oculars: 10X eyepieces - Lamphouse: 350W lamphouse - Lamp: 350W High Pressure Mercury (Hg) lamp is currently installed - Exposure Optics: UV400 - Optical Sensor: CH1: 365nm, CH2: 405nm - Timer: Digital - CIC Power Supply: CIC 1000 constant intensity controller NOTE: THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS: DUV APPLICATIONS (254nm) IR ALIGNMENT. PLEASE CONTACT US FOR DETAILS AND PRICING - Tooling: Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size - Vib/Iso Table: Sold separately; subject to availability at time of order構成
構成なしOEMモデルの説明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."ドキュメント
ドキュメントなし
カテゴリ
Mask/Bond Aligners
最終検証： 28日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
125838
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
SUSS MicroTec / KARL SUSS
MJB3
カテゴリ
Mask/Bond Aligners
最終検証： 28日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
125838
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter. - Microscope: M400 Normalfield with revolving objective turret and trinocular microscope head - Microscope Objectives: Leitz NPL 5X, 10X, and 20X objectives - Microscope Oculars: 10X eyepieces - Lamphouse: 350W lamphouse - Lamp: 350W High Pressure Mercury (Hg) lamp is currently installed - Exposure Optics: UV400 - Optical Sensor: CH1: 365nm, CH2: 405nm - Timer: Digital - CIC Power Supply: CIC 1000 constant intensity controller NOTE: THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS: DUV APPLICATIONS (254nm) IR ALIGNMENT. PLEASE CONTACT US FOR DETAILS AND PRICING - Tooling: Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size - Vib/Iso Table: Sold separately; subject to availability at time of order構成
構成なしOEMモデルの説明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."ドキュメント
ドキュメントなし