説明
Photolithography Scanner 248nm Handler System - WL Type 3 Interface - Open Cassette構成
Software Version - MCSV CIM - SECS Process - PhotolithographyOEMモデルの説明
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.ドキュメント
ドキュメントなし
同様のリスト
すべて表示
NIKON
NSR-S204B
カテゴリ
Steppers & Scanners
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
146714
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Photolithography Scanner 248nm Handler System - WL Type 3 Interface - Open Cassette構成
Software Version - MCSV CIM - SECS Process - PhotolithographyOEMモデルの説明
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.ドキュメント
ドキュメントなし