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説明
M/PLEX Multiplex ICP Etcher構成
Surface Technology Systems M/PLEX Multiplex ICP Etcher, 400V, 50Hz, 3ph, w/ MAG900CT turbopump. Includes power distribution & control rack cabinet, w/ power distribution, Electrogrip electrostatic driver, vAT PM-7 adaptive pressure controller, Leybold Mag Drive 1000 pump controller; ENI ACG-10B RF generator; ENI ACG-3B-06 RF generator; ENI VL-400 phase shift controller; PowerBright VC-2000 step-up/down transformer; BOC Edwards iQDP-80 roughing pump, code# A532-80-905; Neslab RTE-211 recirculating chiller, BOM# 135103200702; gas cabinet; LEP300 control server. Configured for 3in substrates.OEMモデルの説明
The STS MULTIPLEX ICP is an etch system. The STS MULTIPLEX ICP can be used with 2” wafer sizes. It has a silicon material plate and ASE polymer system processer.ドキュメント
ドキュメントなし
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
126234
ウェーハサイズ：
3"/75mm
ヴィンテージ：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
STS
MULTIPLEX ICP
カテゴリ
Dry / Plasma Etch
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
126234
ウェーハサイズ：
3"/75mm
ヴィンテージ：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
M/PLEX Multiplex ICP Etcher構成
Surface Technology Systems M/PLEX Multiplex ICP Etcher, 400V, 50Hz, 3ph, w/ MAG900CT turbopump. Includes power distribution & control rack cabinet, w/ power distribution, Electrogrip electrostatic driver, vAT PM-7 adaptive pressure controller, Leybold Mag Drive 1000 pump controller; ENI ACG-10B RF generator; ENI ACG-3B-06 RF generator; ENI VL-400 phase shift controller; PowerBright VC-2000 step-up/down transformer; BOC Edwards iQDP-80 roughing pump, code# A532-80-905; Neslab RTE-211 recirculating chiller, BOM# 135103200702; gas cabinet; LEP300 control server. Configured for 3in substrates.OEMモデルの説明
The STS MULTIPLEX ICP is an etch system. The STS MULTIPLEX ICP can be used with 2” wafer sizes. It has a silicon material plate and ASE polymer system processer.ドキュメント
ドキュメントなし