説明

- SECS/GEM - All Cables Present Details Attached

構成

- Process: Oxide - Front Surface Finish: White - Process Pressure: Atmospheric - Number of Zones: 5 - Temperature Controller Model: Model 121 - Inner TC Type: In-line - Boat Rotation - Signal Lamp Tower - Gas Leak Detection - 26 Slots - Wafer Type: Notch - Stocker: 21 slot carrier - N2 Purge System - Software Version: V07.06 - System Controller: TS-4000Z - Temperature Range: 960°C (max 1025°C) - Tube Seal: Lip Seal - Transfer Stage Wafer Position Sensor - Fork Wafer Present Sensor - Fork Wafer Position Sensor

OEMモデルの説明

The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.