説明

SECS/GEM All Cables Present Details Attached

構成

Software & Controls: Software Version: V07.06 System Controller: TS-4000Z Model & Process: Process: Oxide Temperature Range: 960°C (max. 1025°C) Front Surface Finish: White System Layout Type: I Process Pressure: Atmospheric Number of Zones: 5 Temperature Controller Model: Model 121 FTP heater Inner TC Type: In-line Boat Rotation Tube Seal: Lip Seal Signal Lamp Tower Gas Leak Detection Wafer and Handling: Wafer Size: 26 slots Wafer Type: Notch Stocker: 21 slot Carrier N2 Purge System Transfer Stage Wafer Position Sensor Fork Wafer Present Sensor Fork Wafer Position Sensor

OEMモデルの説明

The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.