説明
Furnace (FTPS), host station Installed for ONO gate capability, process gases run under engineering.構成
-Base unit ONO process. -Type I deep bay frame -Waves controller -Wafer Diameter: 200 mm -Load: 170 slot boat (150 wfr load size) with boat rotaNon -Heater element: 500C – 1000C -Process gases: NH3, DCS, N2O, N2OEMモデルの説明
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
ALPHA-8SE
検証済み
カテゴリ
Furnaces / Diffusion
最終検証： 3日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
91212
ウェーハサイズ：
6"/150mm, 8"/200mm
ヴィンテージ：
2018
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
ALPHA-8SE
カテゴリ
Furnaces / Diffusion
最終検証： 3日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
91212
ウェーハサイズ：
6"/150mm, 8"/200mm
ヴィンテージ：
2018
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Furnace (FTPS), host station Installed for ONO gate capability, process gases run under engineering.構成
-Base unit ONO process. -Type I deep bay frame -Waves controller -Wafer Diameter: 200 mm -Load: 170 slot boat (150 wfr load size) with boat rotaNon -Heater element: 500C – 1000C -Process gases: NH3, DCS, N2O, N2OEMモデルの説明
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.ドキュメント
ドキュメントなし