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TEL / TOKYO ELECTRON ALPHA-8SE
    説明
    The unit is fully functional and has PAC to prevent cracking.
    構成
    Refurbished by TEL in 2018 TEL Certified Used Tool Base unit ONO process. Quartz for Process & Loading Fixture Maintenance Fixture US Safety S2-93 ONO Process Specific Option -Integrated Gas System For ONO -2 NH3 Gas Line -1 DCS Gas Line -1 N2O Gas Line w/ PAC Unit -6 N2 Gas Line Thermal ALPHA-8SE Processing -Normal I/O Configuration -25 Wafers/Cassette without Notch Alignment -21 Cassette Loading Automation -8 inch Wafer Handling Capability -Wafer Load Automation -Wafer Counter -Auto Tube Shutter -Boat Elevator Cassette and Wafer Handling Automation -Power Supply Unit, Control Unit: 3-ph 480VAC, 1-ph 208VAC -Main Controller (WAVES) -Temperature Controller (Model 560) -VMN-40-101 500-1000C Cabinets/Units/Controllers -Furnace Cabinet (I Type Deep Bay Layout)
    OEMモデルの説明
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
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    ドキュメントなし

    TEL / TOKYO ELECTRON

    ALPHA-8SE

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    検証済み

    カテゴリ
    Furnaces / Diffusion

    最終検証: 16日前

    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    103893


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明

    Have Additional Questions?
    Logistics Support
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    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
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    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    ヴィンテージ: 2003状態: 中古
    最終確認23日前

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    検証済み
    カテゴリ
    Furnaces / Diffusion
    最終検証: 16日前
    listing-photo-ea9f9ccac6684a4a90965f145a5fc3f0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/77608/ea9f9ccac6684a4a90965f145a5fc3f0/d497add6e11f4c718778743df7b04539_08a1493132f44956b793b614bb8b66fd_mw.jpeg
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    103893


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    The unit is fully functional and has PAC to prevent cracking.
    構成
    Refurbished by TEL in 2018 TEL Certified Used Tool Base unit ONO process. Quartz for Process & Loading Fixture Maintenance Fixture US Safety S2-93 ONO Process Specific Option -Integrated Gas System For ONO -2 NH3 Gas Line -1 DCS Gas Line -1 N2O Gas Line w/ PAC Unit -6 N2 Gas Line Thermal ALPHA-8SE Processing -Normal I/O Configuration -25 Wafers/Cassette without Notch Alignment -21 Cassette Loading Automation -8 inch Wafer Handling Capability -Wafer Load Automation -Wafer Counter -Auto Tube Shutter -Boat Elevator Cassette and Wafer Handling Automation -Power Supply Unit, Control Unit: 3-ph 480VAC, 1-ph 208VAC -Main Controller (WAVES) -Temperature Controller (Model 560) -VMN-40-101 500-1000C Cabinets/Units/Controllers -Furnace Cabinet (I Type Deep Bay Layout)
    OEMモデルの説明
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusionヴィンテージ: 2003状態: 中古最終検証: 23日前
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusionヴィンテージ: 2003状態: 中古最終検証: 30日以上前
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusionヴィンテージ: 0状態: 改修済み最終検証: 16日前