説明
Mask Aligner構成
KARL SUSS MJB3 Type:10000003 Power 220v/50Hz/500VA UV400 Optics Lamp House 200 watt Operation Modes: Soft Contact/Hard Contact Chuck for 3” wafers and Mask Holder for 4” masks Single Microscope with 3 objectives X5, X10, X20 (Includes illumination power supply) UV Power Supply 1000watt, (For the mercury lamp) with offboard Ignition Box. Operation/Service Manual (soft pdf file)OEMモデルの説明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."ドキュメント
ドキュメントなし
SUSS MicroTec / KARL SUSS
MJB3
検証済み
カテゴリ
Mask/Bond Aligners
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
66669
ウェーハサイズ：
3"/75mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
SUSS MicroTec / KARL SUSS
MJB3
カテゴリ
Mask/Bond Aligners
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
66669
ウェーハサイズ：
3"/75mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Mask Aligner構成
KARL SUSS MJB3 Type:10000003 Power 220v/50Hz/500VA UV400 Optics Lamp House 200 watt Operation Modes: Soft Contact/Hard Contact Chuck for 3” wafers and Mask Holder for 4” masks Single Microscope with 3 objectives X5, X10, X20 (Includes illumination power supply) UV Power Supply 1000watt, (For the mercury lamp) with offboard Ignition Box. Operation/Service Manual (soft pdf file)OEMモデルの説明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."ドキュメント
ドキュメントなし